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Polishing Ver 3.0

Polishing Ver 3.0
Semiconductor Solutions
Polishing Ver 3.0

Equipment that automatically loads wafer specimens from stubs supplied by AMR robots, tilts the specimens from a vertical position for polishing and cleaning, and automatically unloads them.

SEMICONDUCTOR SOLUTIONS
Polishing Ver 3.0
SPECIFICATION
  • Dimensions
    2,815(L) x 1,530(W) x 2,000(H)
  • Weight
    Approx 6,500kg
  • AP Field
    Semiconductor
  • Wafer
    10(L) x 10(W) x 0.8(T)
  • Polish Jig
    75(D) x 75(W) x 8.5(T)
FEATURES

Designed to grip specimens horizontally by vacuum suction and polish their edges at an angle of 3° to 5°.